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Effect Of Gel-films-thickness And Sintering Conditions On The Crystal Structure And Microstructure Of Alkoxy-derived Batio_3 Thin Films

机译:凝胶膜厚度和烧结条件对烷氧基Batio_3薄膜晶体结构和微观结构的影响

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Various BaTiO_3 thin films were fabricated at 650℃ by using different conditions such as the heating rate and alkoxy-derived gel-film thickness. In this study, the spin-coating and calcination step were repeated several times to control the gel-films thickness. And then the one-sintering was carried out with various heating rates. BaTiO_3 films with perovskite phase were obtained by using the heating rate of 100℃/sec and the surface morphology became rough with increase of gel-film thickness. We considered that the change of root mean square (rms) roughness and cross-sectional profiles by various heating rates was caused by densification.
机译:在不同的条件下,如加热速率和烷氧基衍生的凝胶膜厚度,在650℃下制备了各种BaTiO_3薄膜。在这项研究中,旋涂和煅烧步骤重复了几次,以控制凝胶膜的厚度。然后以各种加热速率进行一次烧结。以100℃/ sec的升温速率得到钙钛矿相BaTiO_3薄膜,随着凝胶膜厚度的增加,其表面形貌变得粗糙。我们认为,各种加热速率引起的均方根(rms)粗糙度和横截面轮廓的变化是由致密化引起的。

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