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Development of stable, non-cyanide solutions for electroplating Au-Sn alloy films

机译:开发用于电镀Au-Sn合金膜的稳定的非氰化物溶液

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Au-Sn alloys, with a range of compositions, can be successfully pulse plated onto blank wafers and patterned wafers using a slightly acidic, chloride based solution. However, the plating solution has limited stability (about two to three days), after which deposit compositions are not controllable. The aim of this work was to develop a more stable Au-Sn electroplating solution. An alternative, to a single Au-Sn electroplating solution, is to prepare separate Au and Sn solutions and then mix them as needed to generate the Au-Sn solution. Using this approach, Au and Sn solutions were produced, which were stable for at least 12 months. The stable Au solution consisted of KAuCl_(4), ammonium citrate, and sodium sulfite; the stable Sn solution consisted of SnCl_(2) (centre dot) 2H_(2)O and ammonium citrate. Ascorbic acid is an important bridge component between the 2 solutions. Electroplating results showed that deposit composition, morphology and plating rate from the newly developed mixture were very similar to those obtained from the conventional Au-Sn solution.
机译:具有多种组成的Au-Sn合金可以使用弱酸性的氯化物基溶液成功地脉冲电镀到空白晶片和有图案的晶片上。然而,镀液的稳定性有限(约两至三天),此后沉积物组成是不可控制的。这项工作的目的是开发一种更稳定的Au-Sn电镀溶液。对于单一的Au-Sn电镀溶液,替代方法是准备单独的Au和Sn溶液,然后根据需要将它们混合以生成Au-Sn溶液。使用这种方法,可以生产至少稳定12个月的Au和Sn溶液。稳定的金溶液由KAuCl_(4),柠檬酸铵和亚硫酸钠组成。稳定的锡溶液由SnCl_(2)(中心点)2H_(2)O和柠檬酸铵组成。抗坏血酸是两种溶液之间的重要桥梁成分。电镀结果表明,新开发的混合物的沉积物组成,形貌和镀覆速率与常规Au-Sn溶液的沉积沉积物,形态和镀覆速率非常相似。

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