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首页> 外文期刊>Journal of Applied Physics >Effect of a forming field on the magnetic and structural properties of thin Fe-Ga films
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Effect of a forming field on the magnetic and structural properties of thin Fe-Ga films

机译:成形磁场对Fe-Ga薄膜的磁性和结构性能的影响

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摘要

The structural, magnetic, and magnetostrictive properties of 75 nm Fe_(100-x)Ga_x films (0 ≤ x ≤ 30) have been studied to determine how a forming field during growth affects these properties. Two film sets were grown using a cosputtering-evaporation technique with and without a forming field of 65 kA m~(-1). Using x-ray diffraction, the texture, lattice parameter, and the grain size were determined. An out-of-plane < 110 > texture was found for all films. The magnetization loops were measured on a magneto-optic Kerr effect magnetometer, from which the anisotropy symmetry was inferred from the remanent magnetization. It was found that the forming field produced a pronounced uniaxial anisotropy. The effective magnetostriction constant was measured using the Villari effect. The effective magnetostriction constant was compared with that calculated for a polycrystalline film with < 110 > out-of-plane texture using bulk constants, and the results are discussed.
机译:已经研究了75 nm Fe_(100-x)Ga_x薄膜(0≤x≤30)的结构,磁和磁致伸缩性能,以确定在生长过程中的形成场如何影响这些性能。使用共溅射蒸发技术在有和没有65 kA m〜(-1)的形成场的情况下生长了两套薄膜。使用X射线衍射,确定织构,晶格参数和晶粒尺寸。在所有胶片上均发现面外<110>纹理。在磁光克尔效应磁力计上测量磁化回路,从剩余磁化强度推断出各向异性对称性。发现形成场产生明显的单轴各向异性。有效的磁致伸缩常数是用维拉里效应测量的。使用体积常数将有效磁致伸缩常数与具有<110>面外织构的多晶膜计算的磁致伸缩常数进行比较,并讨论了结果。

著录项

  • 来源
    《Journal of Applied Physics 》 |2009年第2期| 375-377| 共3页
  • 作者单位

    Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom;

    Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom;

    Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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