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Grain-boundary-limited carrier mobility in polycrystalline silicon with negative temperature dependence: modeling carrier conduction through grain-boundary traps based on trap-assisted tunneling

机译:具有负温度依赖性的多晶硅中的晶界限制载流子迁移率:基于陷阱辅助隧穿的通过晶界陷阱的载流子传导模型

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摘要

Seto's model based on thermionic emission (TE) theory explains that the grain-boundary (GB)-limited carrier mobility in polycrystalline silicon (poly-Si) has a positive temperature dependence. Although this model is widely accepted as a standard model for GB-limited carrier mobility in poly-Si, many experimental measurements under steady-state conditions support extremely weak or negative temperature dependence. In this report, we formulate carrier conduction through GB traps by utilizing the trap-assisted tunneling (TAT) model based on non-radiative multi-phonon transition theory. Self-consistent calculation of poly-Si under steady-state conditions reveals that TAT current exceeds TE current in regions with high GB potential barriers. In contrast to Seto's model, our novel model reproduces the negative dependence of GB-limited carrier mobility on temperature. From the viewpoint of consistency with experimental measurements, our model seems to be suitable for describing carrier conduction in poly-Si under steady-state conditions. (C) 2019 The Japan Society of Applied Physics
机译:Seto基于热电子发射(TE)理论的模型解释说,多晶硅(poly-Si)中受晶界(GB)限制的载流子迁移率具有正温度依赖性。尽管此模型已被广泛接受为多晶硅中GB限制的载流子迁移的标准模型,但在稳态条件下进行的许多实验测量都支持极弱或负的温度依赖性。在本报告中,我们利用基于非辐射多声子跃迁理论的陷阱辅助隧穿(TAT)模型来制定通过GB陷阱的载流子传导。在稳态条件下对多晶硅进行的自洽计算表明,在具有高GB势垒的区域中,TAT电流超过TE电流。与Seto模型相反,我们的新颖模型再现了GB限制的载流子迁移率对温度的负依赖性。从与实验测量的一致性的角度来看,我们的模型似乎适合描述稳态条件下多晶硅中的载流子传导。 (C)2019日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sb期|SBBA01.1-SBBA01.8|共8页
  • 作者单位

    Toshiba Memory Corp, Inst Memory Technol Res & Dev, Saiwai Ku, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan;

    Toshiba Memory Corp, Inst Memory Technol Res & Dev, Saiwai Ku, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan;

    Toshiba Memory Corp, Inst Memory Technol Res & Dev, Saiwai Ku, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan;

    Toshiba Memory Corp, Inst Memory Technol Res & Dev, Saiwai Ku, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan;

    Toshiba Memory Corp, Inst Memory Technol Res & Dev, Saiwai Ku, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan;

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