Fabrication of hydrophobic/hydrophilic HMDSO films by atmospheric pressure plasma jet deposition

摘要

Silicon-oxide thin films were deposited by atmospheric pressure plasma jet (APPJ) using hexamethyl disiloxane (HMDSO) as a precursor. The properties of the deposited films were characterized by using field emission scanning electron microscope (FE-SEM), attenuated total reflectance-Fourier transform infrared spectrometer (ATR FTIR), water contact angle (WCA) measurements, and electron spectroscopy for chemical analysis (ESCA). The results revealed that the film thickness increased as a function of the applied power. At the same time, the surface morphology varied correspondingly which correlated closely to the surface wettability of the deposited thin films. At the applied powers of 50 W and 100 W, the morphology of the aggregated particles possessed a WCA of similar to 140 degrees and similar to 110 degrees, respectively. On the other hand, the superhydrophilic (WCA 10 degrees) surface of the deposited film was obtained by applying 140 W. The investigation demonstrated that the morphological change of deposited HMDSO films might play the most important role on surface wettability comparing with the chemical composition, which implies the deposited thin films possess great potential for the applications as the barrier layers for releasing applications. (C) 2018 The Japan Society of Applied Physics