Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet

摘要

Deposition of electrochromic organonickel oxide (NiO_xC_y) films onto glass/indium tin oxide (ITO) substrates using atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet under various precursor injection angles is investigated. A precursor [nickelocene, Ni(C_5H_4)_2] vapor, carried by argon gas and mixed with oxygen gas, is injected into an air plasma torch for the deposition of NiO_xC_y films by a short exposure of the substrate, 20 s, in the plasma.,Uniform light modulation on glass/ITO/NiO_xC_y is produced while the moving glass/ITO substrate is exposed to the plasma torch at room temperature (～23℃) and under atmospheric pressure. Light modulation with up to a 40.9% transmittance variation at a wavelength of 513.9 nm under Li+ intercalation and de-intercalation in a 1 M LiClO_4-propylene carbonate electrolyte is achieved.