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Experimental investigation of atmospheric pressure nonequilibrium plasma chemistry for plasma assisted chemical vapor deposition (PACVD) of diamond thin films

机译：大气压非平衡等离子体化学处理金刚石薄膜的等离子体辅助化学气相沉积（PACVD）的实验研究

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作者
Baldwin, Scott Keith, Jr.;
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作者单位

Stanford University;

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授予单位 Stanford University;
学科
学位 Ph.D.
年度 1996
页码 123 p.
总页数 123
原文格式 PDF
正文语种 eng
中图分类
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入库时间 2022-08-17 11:59:16

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1. Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet [J] . Yung-Sen Lin, Di-Jiun Lin, Ping-Ju Sung, Thin Solid Films . 2013,第apra1期

机译：大气压等离子体射流在大气压等离子体下增强电致变色有机镍氧化物薄膜的化学气相沉积
2. The large area deposition of diamond by the multi-cathode direct current plasma assisted chemical vapor deposition (DC PACVD) method [J] . Jae-Kap Lee, Kwang Yong Eun, Young-Joon Baik, Diamond and Related Materials . 2002,第3a6期

机译：多阴极直流等离子体辅助化学气相沉积（DC PACVD）方法大面积沉积金刚石
3. Novel chemical vapor deposition process of ZnO films using nonequilibrium N_2 plasma generated near atmospheric pressure with small amount of O_2below 1% [J] . Yukinori Nose, Takeshi Yoshimura, Atsushi Ashida, Journal of Applied Physics . 2016,第17期

机译：ZnO薄膜的化学气相沉积新工艺，该工艺使用非平衡N_2等离子体在大气压下产生，少量O_2低于1％
4. Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition [C] . C. Shim, J. Yang, Y.C. Quan, European conference on chemical vapor deposition . 2001

机译：等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
5. Chemical kinetic calculations of the gas phase in atmospheric pressure microwave plasma-assisted chemical vapor deposition of diamond. [D] . Bastani-Parizi, Hamideh. 1993

机译：大气压微波等离子体辅助金刚石化学气相沉积中气相的化学动力学计算。
6. Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms [O] . Tsegaye Gashaw Getnet, Gabriela F. da Silva, Iolanda S. Duarte, 2020

机译：不锈钢上碳酸薄膜的大气压等离子体化学气相沉积减少了大肠杆菌和金黄色葡萄球菌的形成
7. High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus with Rotary Electrode. [O] . Yuzo MORI, Kumayasu YOSHII, Kiyoshi YASUTAKE, 1999

机译：大气压等离子体化学气相沉积的非晶硅薄膜的高速率沉积。（第一个报告）。具有旋转电极的大气压等离子体CVD装置的设计与生产。
8. Diamond thin films grown by microwave plasma assisted chemical vapor deposition. [R] . M. Leksono 1991

机译：通过微波等离子辅助化学气相沉积生长的金刚石薄膜。

Experimental investigation of atmospheric pressure nonequilibrium plasma chemistry for plasma assisted chemical vapor deposition (PACVD) of diamond thin films

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