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Improved external quantum efficiency of 293 nm AlGaN UVB LED grown on an AlN template

机译:在AlN模板上生长的293 nm AlGaN UVB LED的改善的外部量子效率

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摘要

Smart, low cost and environmentally safe AlGaN-based UVB LEDs are promising in many real world applications including medical as well as agricultural sciences. The main purpose of this work is to develop a crystal growth technique for an n-AlGaN buffer layer (BL) including an n-AlGaN current spreading layer (CSL) for obtaining a high internal quantum efficiency (IQE) from UVB-emitting multi quantum wells (MQWs). By the reduction of the edge type threading dislocation densities in the n-AlGaN CSL, as well as the optimization of the quantum well (QW) thickness, the IQE of about 42% was improved for UVB MQWs, with an emission wavelength of 294 nm. Subsequently, the external quantum efficiency improved from 2.7% to 3.3% at 20 mA under the continuous wave (CW) operation and the maximum output power also improved from 10.8 mW to 12.5 mW at 126 mA, respectively. 293 nm UVB LED fight sources are very useful for the application of vitamin D3 production in the human body. (C) 2018 The Japan Society of Applied Physics
机译:智能,低成本和对环境安全的基于AlGaN的UVB LED在许多现实世界的应用(包括医学和农业科学)中都有希望。这项工作的主要目的是开发一种包括n-AlGaN电流扩散层(CSL)的n-AlGaN缓冲层(BL)的晶体生长技术,以便从发出UVB的多量子获得高内部量子效率(IQE)井(MQW)。通过降低n-AlGaN CSL中的边缘型穿线位错密度以及优化量子阱(QW)厚度,对于UVB MQW,发射波长为294 nm,IQE提高了约42% 。随后,在连续波(CW)操作下,外部量子效率在20 mA下在20 mA下从2.7%提高到3.3%,最大输出功率在126 mA下也从10.8 mW提高到12.5 mW。 293 nm UVB LED战斗源对于人体中维生素D3生产的应用非常有用。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第sa期|SAAF01.1-SAAF01.8|共8页
  • 作者单位

    RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan|RIKEN, Ctr Adv Photon RAP, 2-1 Hirosawa, Wako, Saitama 3510198, Japan;

    RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan|Saitama Univ, Sakura Ku, 255 Shimo Okubo, Saitama 3388570, Japan;

    RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan|RIKEN, Ctr Adv Photon RAP, 2-1 Hirosawa, Wako, Saitama 3510198, Japan;

    Saitama Univ, Sakura Ku, 255 Shimo Okubo, Saitama 3388570, Japan;

    RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan|RIKEN, Ctr Adv Photon RAP, 2-1 Hirosawa, Wako, Saitama 3510198, Japan;

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