首页> 外文期刊>Japanese Journal of Applied Physics. Part 2, Letters & Express Letters >Fabrication and Characteristics of Sputter-Induced Carbon Nanoneedle Field Emitters and Si Electron-Transparent Films for Application to Electron-Beam-Pumped Light Sources
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Fabrication and Characteristics of Sputter-Induced Carbon Nanoneedle Field Emitters and Si Electron-Transparent Films for Application to Electron-Beam-Pumped Light Sources

机译:溅射诱导碳纳米针场发射极和硅电子透明薄膜的制备及其特性,用于电子束泵浦光源

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摘要

We have fabricated novel sputter-induced carbon nanoneedle field emitters and Si electron-transparent films for application to electron-beam-pumped light sources. The sputter-induced carbon nanoneedle field emitters exhibited a stable electron emission of 0.1mA at an average field of 13V/μm. The 1.5-μm-thick Si electron-transparent films achieved an electron transmittance of about 60% at an acceleration voltage of 27 kV. We also demonstrated an electron-beam-pumped light source realized by the excitation of N_2 gas, and clearly observed an N_2 gas spectrum with a peak at 337 nm.
机译:我们已经制造出了新颖的溅射诱导碳纳米针场发射器和Si电子透明膜,可应用于电子束泵浦光源。溅射诱导的碳纳米针场发射器在13V /μm的平均场下表现出0.1mA的稳定电子发射。 1.5μm厚的Si电子透明膜在27 kV的加速电压下实现了约60%的电子透射率。我们还演示了通过激发N_2气体实现的电子束泵浦光源,并清楚地观察到一个峰值为337 nm的N_2气体光谱。

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