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Post-thermal Annealing Effects on Photoluminescence Properties of InAs Quantum Dots on GaNAs Buffer Layer

机译:热退火对GaNAs缓冲层上InAs量子点光致发光特性的影响

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摘要

The thermal annealing characteristics of InAs quantum dots (QDs) on a GaNAs buffer layer grown by the metalorganic chemical vapor deposition were investigated. Although the photoluminescence efficiency was deteriorated by annealing, the improved tolerance in the annealing time and temperature was confirmed in comparison with the GaAs buffer sample. The wavelength blue shift was similar in both buffer layers. The improvements in the PL efficiency were considered to be related to the decreased coalescent QDs upon introducing the dilute-nitrogen into the buffer layer.
机译:研究了通过有机金属化学气相沉积法生长的GaNAs缓冲层上InAs量子点(QDs)的热退火特性。尽管退火导致光致发光效率降低,但是与GaAs缓冲样品相比,退火时间和温度的耐受性得到了改善。在两个缓冲层中,波长蓝移相似。 PL效率的提高被认为与将稀氮引入缓冲层后聚结QD降低有关。

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  • 来源
    《Japanese journal of applied physics》 |2011年第3issue1期|p.25-27|共3页
  • 作者单位

    Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:36

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