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Effect of thermal annealing in the microstructural and the optical properties of uncapped InAs quantum dots grown on GaAs buffer layers

机译:热退火对GaAs缓冲层上生长的无盖InAs量子点的微观结构和光学性质的影响

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The effect of thermal annealing on self-assembled uncapped InAs/GaAs quantum dots (QDs) has been investi2ated using transmission electron microscopy (TEM) and photolurninescence (PL) measurement. The TEM images showed that the lateral sizes and densities of the InAs QDs were not changed significantly up to 6-50degreesC. When the InAs/GaAs QDs were annealed at 700 degreesC, while the lateral size of the InAs QDs increased. their density decreased. The InAs QDs disappeared at 800 degreesC. PL spectra showed that the peaks corresponding to the interband transitions of the InAS QDs shifted slightly toward the high-energy side, and the PL intensity decreased with increasing annealing temperature. These results indicate that the microstructural and the optical properties of self-assembled uncapped InAs/GaAs can he modified due to postgrowth thermal annealing. (C) 2005 Elsevier Ltd. All rights reserved.
机译:已经使用透射电子显微镜(TEM)和光致发光(PL)测量研究了热退火对自组装未封端的InAs / GaAs量子点(QDs)的影响。 TEM图像显示,InAs量子点的横向尺寸和密度在6至50摄氏度下均无明显变化。当InAs / GaAs QD在700摄氏度下退火时,InAs QD的横向尺寸增加。它们的密度下降。 InAs QD在800摄氏度时消失。 PL光谱显示,与InAS QD的带间跃迁相对应的峰向高能侧略微偏移,并且PL强度随退火温度的升高而降低。这些结果表明,由于后生长的热退火,自组装的无盖InAs / GaAs的微观结构和光学性质可能会发生变化。 (C)2005 Elsevier Ltd.保留所有权利。

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