首页> 外文期刊>Japanese Journal of Applied Physics. Part 2, Letters & Express Letters >Photoluminescence Characterization of InAs Quantum Dots on GaNAs Buffer Layer by Metalorganic Chemical Vapor Deposition
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Photoluminescence Characterization of InAs Quantum Dots on GaNAs Buffer Layer by Metalorganic Chemical Vapor Deposition

机译:金属有机化学气相沉积法在GaNAs缓冲层上InAs量子点的光致发光特性

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摘要

The photoluminescence (PL) characteristics of InAs quantum dots on a GaNAs buffer layer grown by metalorganic chemical vapor deposition were investigated. A maximum 60 nm redshift was observed for a nitrogen composition of less than 3% in the buffer layer with an increase in emission efficiency in comparison with a conventional GaAs buffer layer. A large intensity increase with a blueshift of PL was observed for a buffer layer of 3% nitrogen composition. These were due to a change in the dot morphology on the GaNAs buffer layer. The InAs supply and growth temperature dependences of PL properties were also examined in detail.
机译:研究了通过有机金属化学气相沉积法生长的GaNAs缓冲层上InAs量子点的光致发光(PL)特性。与常规的GaAs缓冲层相比,在缓冲层中氮含量小于3%时观察到最大60nm的红移,并且发射效率增加。对于3%氮组成的缓冲层,观察到随着PL的蓝移,强度大大增加。这是由于GaNAs缓冲层上的点形态发生了变化。还详细研究了PL特性的InAs供给和生长温度依赖性。

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