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机译:硅通孔电镀铜薄膜互连的晶体学质量的提高
Fracture and Reliability Research Institute, Tohoku University, Sendai 980-8579, Japan;
Fracture and Reliability Research Institute, Tohoku University, Sendai 980-8579, Japan;
Department of Nanomechanics, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;
Department of Nanomechanics, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;
Department of Nanomechanics, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan;
Fracture and Reliability Research Institute, Tohoku University, Sendai 980-8579, Japan;
机译:晶界的结晶质量对电镀铜薄膜互连的机械和电气性能的影响
机译:增强衬有LPCVD氮化硅或PE-ALD氮化钛的高纵横比硅通孔的可湿性,以进行无孔自底向上的铜电镀
机译:结晶度对电镀铜薄膜互连电渗透性的影响
机译:SI基体中电镀铜薄膜与薄膜互连的晶体学质量评估
机译:热循环铜直通硅通孔的热机械效应。
机译:通过优化溅射和电镀条件改善硅通孔的完全填充
机译:电子互连电镀微铜柱的仿真与表征