首页> 外国专利> METHOD FOR PRODUCING SUBSTRATE HAVING THROUGH-SILICON VIAS, SUBSTRATE HAVING THROUGH-SILICON VIAS, AND COPPER PASTE FOR THROUGH-SILICON VIA FORMATION

METHOD FOR PRODUCING SUBSTRATE HAVING THROUGH-SILICON VIAS, SUBSTRATE HAVING THROUGH-SILICON VIAS, AND COPPER PASTE FOR THROUGH-SILICON VIA FORMATION

机译:生产具有贯穿硅的基质的材料,具有贯穿硅的基质的材料和用于形成硅的铜糊的方法

摘要

This method for producing a substrate having through-silicon vias according to one embodiment comprises: a preparation step for preparing a silicon substrate having through-holes that communicate with both main surfaces; a copper sintered body formation step for forming a copper sintered body having a porous structure, such that the copper sintered body fills at least through-holes; a resin impregnation step for impregnating the copper sintered body with a curable resin composition; and a resin curing step for curing the curable resin composition that has impregnated the copper sintered body and thereby forming a conductor that is constituted of the copper sintered body having pores packed with resin cured product, to provide through-silicon vias in the through-holes.
机译:根据一个实施例的这种具有贯通硅通孔的衬底的制造方法包括:准备步骤,用于准备具有与两个主表面连通的通孔的硅衬底;铜烧结体形成步骤,用于形成具有多孔结构的铜烧结体,以使该铜烧结体至少填充通孔。树脂浸渍工序,其使固化性树脂组合物含浸于铜烧结体中。树脂固化步骤,其用于使浸渍有铜烧结体的固化性树脂组合物固化,从而形成由具有填充有树脂固化物的细孔的铜烧结体构成的导体,从而在贯通孔中设置贯通硅通孔。 。

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