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A Fully Analytical Model for the Series Impedance of Through-Silicon Vias With Consideration of Substrate Effects and Coupling With Horizontal Interconnects

机译:考虑衬底效应和水平互连耦合的硅通孔串联阻抗的完整分析模型

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摘要

This paper introduces a fully analytical and physical model capable of extracting high-frequency series impedance of through-silicon vias (TSVs) in 3-D integrated chips with consideration of the eddy currents in the surrounding Si substrate and coupling with horizontal interconnects. The model employs the vertical-to-vertical and horizontal-to-vertical 3D vector potential Green's function in layered media and is concise and sufficiently accurate in the entire range of interest for both the frequency and the center-to-center distance between TSVs. Along with the series impedances between horizontal wires, which are extracted from the discrete complex image method, as well as the TSV and horizontal wire capacitance values, the total loop impedance can be obtained. Our approach is verified against a full-wave finite- element-method electromagnetic solver High Frequency Structure Simulator, and it shows good accuracy ($ 7% error) in the entire frequency range examined (up to 100 GHz). Given the fact that the formulated TSV series impedance model is purely analytical, the model could be efficiently used for system-level interconnect impedance extraction in emerging 3-D integrated systems.
机译:本文介绍了一种完全分析和物理模型,该模型能够提取3-D集成芯片中硅通孔(TSV)的高频串联阻抗,同时考虑到周围Si基板中的涡流并与水平互连耦合。该模型在分层媒体中使用了垂直到垂直和水平到垂直的3D矢量电势格林函数,并且在整个感兴趣范围内,对于TSV之间的频率和中心到中心距离,它都简洁且足够准确。连同从离散复杂图像方法中提取的水平导线之间的串联阻抗,以及TSV和水平导线的电容值,可以获得总环路阻抗。我们的方法在全波有限元方法电磁求解器高频结构仿真器中得到了验证,并且在整个检查的频率范围内(高达100 GHz)都显示出良好的精度(误差为7%)。考虑到公式化的TSV系列阻抗模型仅是分析性的事实,该模型可以有效地用于新兴3D集成系统中的系统级互连阻抗提取。

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