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A new laterally conductive bridge random access memory by fully CMOS logic compatible process

机译:完全兼容CMOS逻辑的新型横向导电桥随机存取存储器

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This paper proposes a novel laterally conductive bridge random access memory (L-CBRAM) module using a fully CMOS logic compatible process. A contact buffer layer between the poly-Si and contact plug enables the lateral Ti-based atomic layer to provide on/off resistance ratio via bipolar operations. The proposed device reached more than 100 pulse cycles with an on/off ratio over 10 and very stable data retention under high temperature operations. These results make this Ti-based L-CBRAM cell a promising solution for advanced embedded multi-time programmable (MTP) memory applications.
机译:本文提出了一种使用完全CMOS逻辑兼容工艺的新型横向导电桥随机存取存储器(L-CBRAM)模块。多晶硅和接触塞之间的接触缓冲层使横向的基于Ti的原子层能够通过双极操作提供开/关电阻比。拟议中的设备达到了超过100个脉冲周期,其开/关比超过10,并且在高温操作下数据保持非常稳定。这些结果使这种基于Ti的L-CBRAM单元成为用于高级嵌入式多时间可编程(MTP)存储器应用的有希望的解决方案。

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  • 来源
    《Japanese journal of applied physics》 |2014年第4s期|04ED10.1-04ED10.5|共5页
  • 作者单位

    Microelectronics Laboratory, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

    Microelectronics Laboratory, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

    Microelectronics Laboratory, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

    Design Technology Division, Taiwan Semiconductor Manufacturing Company (TSMC), Hsinchu 300, Taiwan;

    Electronics and Optoelectronics Research Laboratory, Industrial Technology Research Institute, Hsinchu 31040, Taiwan;

    Electronics and Optoelectronics Research Laboratory, Industrial Technology Research Institute, Hsinchu 31040, Taiwan;

    Microelectronics Laboratory, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

    Microelectronics Laboratory, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan;

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