首页> 外文期刊>Journal of Microelectronics and Electronic Packaging >Design and Demonstration of Fine-Pitch and High-Speed Redistribution Layers for Panel-Based Glass Interposers at 40-μm Bump Pitch
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Design and Demonstration of Fine-Pitch and High-Speed Redistribution Layers for Panel-Based Glass Interposers at 40-μm Bump Pitch

机译:用于40微米凸块间距的基于面板的玻璃插入器的细间距和高速再分配层的设计与演示

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摘要

This article analyzes redistribution layer (RDL) technologiesneeded for 2.5-dimensional (2.5-D) die integration on thinglass interposers and developed using low-cost processes. Thedesign, fabrication, and characterization of a four-metal layer RDLbuildup required for wide input/output (I/O) routing at 40-μmbump pitch and a two-metal layer RDL buildup fabricated directlyon glass for high-speed, off-package signaling are described. SuchRDL technologies are targeted at 2.5-D glass interposer packagesto achieve up to 1 Tb/s die-to-die bandwidth and off-interposerdata rates > 400 Gb/s, driven by consumer demand of online servicesfor mobile devices. Advanced packaging architectures including2.5-D and 3-D interposers require fine-line lithography beyondthe capabilities of current organic package substrates. High electricalloss and high cost are characteristic of silicon interposers fabricatedusing back-end-of-line (BEOL) processes that can achieveRDL wiring densities required for 2.5-D die integration. Organicinterposers with high wiring densities have also been demonstratedusing a single-sided, thin-film process. This article goes beyond siliconand organic interposers in demonstrating fine-pitch RDL onglass interposers fabricated by low-cost, double-side, and panelscalableprocesses. The high modulus and smooth surface of glasshelp to achieve lithographic pitch close to that of silicon. Furthermore,the low permittivity and low loss tangent of glass reducedielectric losses, thus improving high-speed signal propagation. Asemiadditive process flow and projection excimer laser ablationwere used to fabricate four-metal layer (2 + 0 + 2) fine-pitch RDLand two-metal layer RDL directly on glass. A minimum of 3 μmlithography and 20 μm microvia pitch was achieved. Highfrequencycharacterization of these RDL structures demonstratedsingle-ended insertion losses of −0.097 dB/mm at f = 1 GHz anddifferential insertion losses of −0.05 dB/mm at f = 14 GHz.
机译:本文分析了再分配层(RDL)技术需要2.5维(2.5-D)模具整合薄玻璃插入器和使用低成本过程开发。这四金属层RDL的设计,制造和表征宽输入/输出(I / O)路由为40-μm所需的构建凸起间距和直接制造的双金属层RDL Baseup在玻璃上进行高速,描述了脱封信号。这样的RDL Technologies瞄准2.5-D玻璃插入套件实现高达1 TB / S管芯到模具带宽和脱机器数据速率> 400 GB / s,由在线服务的消费者需求驱动对于移动设备。先进的包装架构包括2.5-D和3-D插入器需要超出细线光刻电流有机包装基材的能力。高电器损失和高成本是制造的硅中介体的特征使用可以实现的后端线(BEOL)流程2.5-D模具集成所需的RDL接线密度。有机的还证明了具有高布线密度的插入者使用单面薄膜工艺。这篇文章超越了硅和有机插入者在演示细距RDL由低成本,双侧和盘子制造的玻璃插入器流程。玻璃的高模量和光滑表面帮助实现接近硅的平版音调。此外,玻璃的低介电常数和低损耗正切情况介电损耗,从而提高了高速信号传播。一个半代径工艺流程和投影准分子激光消融用于制造四金属层(2 + 0 + 2)细间距RDL两层二金属层RDL直接在玻璃上。至少3μm达到光刻和20μm的微孔间距。高频这些RDL结构的表征证明F = 1 GHz的单端插入损耗-0.097 db / mmF = 14 GHz的差分插入损耗-0.05 db / mm。

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    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

    3D Systems Packaging Research Center Georgia Institute of Technology 813 Ferst Drive NW Atlanta Georgia 30332;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    2.5-D interposer; excimer laser ablation; glass interposer; redistribution layer; semiadditive process;

    机译:2.5-D插入器;准分子激光消融;玻璃插入器;再分配层;半代理过程;

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