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Total-Ionizing-Dose Effects in Piezoresistive Micromachined Cantilevers

机译:压阻微加工悬臂中的总电离剂量效应

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摘要

We evaluate the response of T-shaped, asymmetric, piezoresistive, micromachined cantilevers fabricated on p-type Si to 10-keV X-ray irradiation. The resonant frequency decreases by 25 ppm at 2.1 Mrad(SiO2), and partially recovers during post-irradiation annealing. An explanation of the results is proposed that is based on radiation-induced acceptor depassivation. This occurs because radiation-generated holes release hydrogen from previously passivated acceptors, causing the carrier concentration to increase, especially near the surface. Increased carrier concentration decreases Young’s modulus, resulting in a decrease in the cantilever resonant frequency. Finite element simulations show that the effect of a decreasing Young’s modulus in the surface region is consistent with the measured decrease in resonant frequency in the irradiated devices.
机译:我们评估在p型硅上制作的T形,不对称,压阻,微加工悬臂对10-keV X射线辐射的响应。共振频率在2.1 Mrad(SiO2)时降低25 ppm,并在辐照后退火期间部分恢复。提出了基于辐射诱导的受体去钝化的结果解释。发生这种情况是因为辐射产生的空穴从先前钝化的受体释放氢,导致载流子浓度增加,尤其是在表面附近。增加的载流子浓度会降低杨氏模量,从而导致悬臂共振频率降低。有限元模拟表明,表面区域杨氏模量降低的影响与被辐照设备中共振频率的降低一致。

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  • 来源
    《Nuclear Science, IEEE Transactions on》 |2017年第1期|263-268|共6页
  • 作者单位

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical and Computer Engineering, University of Louisville, Louisville, KY, USA;

    Department of Electrical and Computer Engineering, University of Louisville, Louisville, KY, USA;

    Department of Electrical and Computer Engineering, University of Louisville, Louisville, KY, USA;

    Department of Electrical and Computer Engineering, University of Louisville, Louisville, KY, USA;

    Department of Electrical and Computer Engineering, University of Louisville, Louisville, KY, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Resonant frequency; Piezoresistance; Silicon; Radiation effects; Micromechanical devices; Young's modulus;

    机译:共振频率;皮电阻;硅;辐射效应;微机械装置;杨氏模量;

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