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A New GaN HEMT Equivalent Circuit Modeling Technique Based on X-Parameters

机译:基于X参数的GaN HEMT等效电路建模新技术

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In this paper, a new accurate small-and large-signal equivalent-circuit-based modeling technique for gallium nitride (GaN) HEMT transistors grown on silicon substrate is presented. Despite X-parameters are developed as tools for the development of black-box modeling, they are used for equivalent-circuit-based model extraction. Unlike traditional modeling that uses the small-signal data to build with an indirect manner a nonlinear model, the proposed model is extracted from X-parameter measurements directly. However, similar to the equivalent-circuit-based models discussed in the literature, the new model is subdivided into extrinsic and intrinsic parts. The extrinsic part consists of linear elements and is related to the physical layout of the transistor. The intrinsic part can be extracted with the proposed analytical de-embedding technique. The nonlinear intrinsic elements are represented by new nonlinear lumped impedances and admittances whose extraction is carried out using a newly proposed technique. This new technique uses nonlinear network parameters, various X-parameter conversion rules, and basic analysis techniques of interconnected nonlinear networks. It is accurate and more advantageous than traditional transistor modeling techniques. The modeling procedure was applied to a 10 μm × 200 μm GaN HEMT with a gate length of 0.25 μm. A very good accordance between model simulations and measurements was obtained, validating the modeling approach.
机译:本文提出了一种新的基于精确的小信号和大信号等效电路的建模技术,用于在硅衬底上生长的氮化镓(GaN)HEMT晶体管。尽管X参数是作为开发黑匣子建模的工具而开发的,但它们仍用于基于等效电路的模型提取。与使用小信号数据以间接方式建立非线性模型的传统建模不同,该提议的模型直接从X参数测量中提取。但是,类似于文献中讨论的基于等效电路的模型,新模型又细分为外部和固有部分。非本征部分由线性元件组成,与晶体管的物理布局有关。可以使用提出的分析去嵌入技术来提取本征部分。非线性本征元素由新的非线性集总阻抗和导纳表示,其提取是使用新提出的技术进行的。这项新技术使用非线性网络参数,各种X参数转换规则以及互连的非线性网络的基本分析技术。它比传统的晶体管建模技术更准确,更有利。将建模过程应用于栅极长度为0.25μm的10μm×200μmGaN HEMT。在模型仿真和测量之间获得了很好的一致性,验证了建模方法。

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