首页> 外文期刊>IEEE transactions on device and materials reliability >The Effect of Electrostatic Discharge on Electrical Overstress Susceptibility in a Gallium Arsenide MESFET-Based Device
【24h】

The Effect of Electrostatic Discharge on Electrical Overstress Susceptibility in a Gallium Arsenide MESFET-Based Device

机译:静电放电对基于砷化镓MESFET的器件中电超应力敏感性的影响

获取原文
获取原文并翻译 | 示例

摘要

The electrostatic discharge (ESD) and electrical overstress (EOS) susceptibility of gallium arsenide (GaAs) MESFET microwave monolithic integrated circuits is investigated using a combination of threshold ESD/EOS tests, ESD step stress tests, and multiple low-level ESD stresses of constant magnitude less than the hard failure threshold voltage. The ESD stresses applied were based on standard ESD test models. Multiple low-level ESD stresses produced no stress hardening or weakening effect on the hard ESD failure threshold voltage of the device and no detectable degradation in electrical performance. However, such stresses were found to increase the device susceptibility to subsequent EOS failure, suggesting that low-level ESD stresses can latently damage GaAs MESFET-based devices. EOS susceptibility did not recover with annealing. The failure signatures suggest that the hard failure mechanisms caused by EOS following the application of low-level ESD stresses are dependent on the amplitude of the pre-ESD stress and that field failures may be caused by successive ESD and EOS stresses. The findings indicate the need for dual ESD and EOS protection in the GaAs MESFET component studied and suggest that the relationship between ESD and EOS susceptibility may need to be considered for other semiconductor technologies.
机译:砷化镓(GaAs)MESFET微波单片集成电路的静电放电(ESD)和电气过应力(EOS)敏感性使用阈值ESD / EOS测试,ESD阶跃应力测试以及恒定的多个低级ESD应力进行了研究幅度小于硬故障阈值电压。施加的ESD应力基于标准ESD测试模型。多个低电平ESD应力不会对器件的硬ESD故障阈值电压产生应力强化或减弱作用,并且不会检测到电气性能下降。但是,发现这种应力会增加器件对随后的EOS故障的敏感性,这表明低水平的ESD应力会潜在地损坏基于GaAs MESFET的器件。 EOS敏感性没有随着退火而恢复。失效特征表明,在施加低水平ESD应力后,由EOS引起的硬性失效机制取决于ESD前应力的幅度,而现场失效可能是由连续的ESD和EOS应力引起的。研究结果表明,在所研究的GaAs MESFET组件中需要双重ESD和EOS保护,并建议其他半导体技术可能需要考虑ESD和EOS磁化率之间的关系。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号