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On the Design of Power-Rail ESD Clamp Circuits With Gate Leakage Consideration in Nanoscale CMOS Technology

机译:纳米CMOS技术中考虑栅极泄漏的电源轨ESD钳位电路设计

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CMOS technology has been widely used to produce many integrated circuits. However, the thinner gate oxide in nanoscale CMOS technology seriously increases the difficulty of electrostatic discharge (ESD) protection design. The power-rail ESD clamp circuit has been the key circuit to perform the whole-chip ESD protection scheme. Some ESD detection circuits were developed to trigger on ESD devices across the power rails to quickly discharge ESD current away from the internal circuits. Therefore, on-chip ESD protection circuits must be designed with the consideration of standby leakage to minimize the power consumption and the possibility of malfunction to normal circuit operation. The design of power-rail ESD clamp circuits with low standby leakage current and high efficiency of layout area in nanoscale CMOS technology is reviewed in this paper. The comparisons among those power-rail ESD clamp circuits are also discussed.
机译:CMOS技术已被广泛用于生产许多集成电路。然而,纳米级CMOS技术中较薄的栅极氧化物严重增加了静电放电(ESD)保护设计的难度。电源导轨ESD钳位电路一直是执行全芯片ESD保护方案的关键电路。开发了一些ESD检测电路,以触发电源轨上的ESD设备,以快速将ESD电流从内部电路释放出去。因此,在设计片上ESD保护电路时必须考虑待机泄漏,以最大程度地降低功耗和正常电路工作出现故障的可能性。本文综述了纳米级CMOS技术中待机功耗低,布局面积效率高的电源轨ESD钳位电路的设计。还讨论了那些电源轨ESD钳位电路之间的比较。

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