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Design of 2 VDD-Tolerant Power-Rail ESD Clamp Circuit With Consideration of Gate Leakage Current in 65-nm CMOS Technology

机译:在65nm CMOS技术中考虑栅极泄漏电流的2个VDD耐压电源轨ESD钳位电路设计

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摘要

A low-leakage 2$times$VDD-tolerant power-rail electrostatic discharge (ESD) clamp circuit composed of the silicon-controlled rectifier (SCR) device and new ESD detection circuit, realized with only thin-oxide 1$times$ VDD devices, has been proposed with consideration of gate leakage current. By reducing the voltage across the gate oxides of the devices in the ESD detection circuit, the whole power-rail ESD clamp circuit can achieve an ultralow standby leakage current. The new proposed circuit has successfully been verified in a 1-V 65-nm CMOS process, which can achieve 6.5-kV human-body-model and 350-V machine-model ESD levels under ESD stresses, but only consumes a standby leakage current of 0.15 $muhbox{A}$ at room temperature under normal circuit operating conditions with 1.8-V bias.
机译:一种低泄漏2倍VDD耐压的电源轨静电放电(ESD)钳位电路,由可控硅(SCR)器件和新型ESD检测电路组成,仅使用薄氧化层1倍VDD器件即可实现考虑栅极漏电流提出了。通过降低ESD检测电路中器件的栅极氧化物两端的电压,整个电源轨ESD钳位电路可以实现超低的待机泄漏电流。新提议的电路已在1V 65nm CMOS工艺中成功验证,该工艺可在ESD应力下达到6.5kV人体模型和350V机器模型ESD等级,但仅消耗待机泄漏电流室温下在正常电路工作条件下具有1.8V偏压的0.15μhhbox{A} $。

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