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Analysis of 80-MeV Carbon and 80-MeV Nitrogen Ion Irradiation Effects on N-Channel MOSFETs

机译:N沟道MOSFET的80meV碳和80meV氮离子辐照效应分析

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N-channel depletion MOSFETs were irradiated with 80 MeV Carbon (C6+) and 80 MeV Nitrogen (N6+) ions in the dose range from 100 krad (Si) to 30 Mrad (Si). The electrical characteristics of MOSFET such as threshold voltage (V-th), density of interface trapped charges (Delta N-it), density of oxide trapped charges (Delta N-ot), transconductance (g(m)), mobility (mu), leakage current (I-L) and drain saturation current (I-DSat) were studied as a function of dose. A considerable increase in Delta N-it and Delta N-ot and decrease in V-th, g(m), mu, and I-D Sat was observed after irradiation. The mu was correlated with Delta N-it and it is found that the contribution of Delta N-ot in degrading the mobility of charge carriers is negligible. The ion irradiated results were compared with Co-60 gamma irradiated results and found that the degradation is more for Co-60 gamma irradiated devices at lower doses, whereas at higher doses, the degradation is more for heavy ion irradiated devices.
机译:用80meV碳(C6 +)和80mEV氮(N6 +)离子的剂量范围为100 krad(si)至30mrad(si),用80meV碳(C6 +)和80meV氮(N6 +)离子进行照射N沟道耗尽MOSFET。 MOSFET的电气特性,如阈值电压(V-TH),界面密度被捕获的电荷(δn-IT),氧化截留电荷的密度(δn-ot),跨导(g(m)),移动性(mu ),作为剂量的函数研究了漏电流(IL)和漏极饱和电流(I-DSAT)。在照射后观察到ΔN-IT和Delta n-OT和δn-OT和V-Th,G(m),mu和I-d的降低的相当大的增加。 MU与Delta N-IT相关,并且发现Delta N-OT在降解电荷载体的迁移性中的贡献可忽略不计。将离子辐照结果与CO-60γ辐照结果进行比较,发现降解更多的是在较低剂量下的CO-60γ辐照的装置,而在较高剂量,重质离子照射器件更加劣化。

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