首页> 外文期刊>IEEE transactions on device and materials reliability >Reliability Characterization of Ring Oscillator Circuits for Advanced CMOS Technologies
【24h】

Reliability Characterization of Ring Oscillator Circuits for Advanced CMOS Technologies

机译:高级CMOS技术环形振荡电路的可靠性表征

获取原文
获取原文并翻译 | 示例

摘要

Ring-Oscillator (RO) are most suitable to investigate the reliability of digital CMOS circuits operating up to GHz frequencies as a good correlation has been observed between RO degradation and Product Fmax degradation. In addition, the RO degradation testing can be performed with similar equipment used for discrete device reliability characterization. In this work, we discuss the role of BTI/HCI contribution in RO degradation and compare the contributions of NFET and PFET devices. To decouple BTI/HCI contribution, AC characterization on discrete devices is conducted and correlated to the RO degradation under diverse testing conditions. Additionally, specially designed reliability RO are used to quantify device type contribution under RO stress.
机译:环形振荡器(RO)最适合于研究对GHz频率的数字CMOS电路的可靠性,因为在RO降解和产品FMAX降解之间观察到良好的相关性。另外,可以使用用于离散设备可靠性表征的类似设备进行RO降级测试。在这项工作中,我们讨论了BTI / HCI在RO退化中的作用以及比较NFET和PFET设备的贡献。为了将BTI / HCI贡献解耦,在离散装置上进行交流表征,并与各种测试条件下的RO劣化相关。此外,特别设计的可靠性RO用于量化RO压力下的器件类型贡献。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号