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Circuit-Based Reliability Characterization Methods in Advanced CMOS Technologies.

机译:先进CMOS技术中基于电路的可靠性表征方法。

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摘要

Integrated circuit reliability has become an increasingly important design consideration as the CMOS technology keeps aggressively scaling to its physical limit. The parametric shifts and circuit failures caused by reliability issues such as Bias Temperature Instability (BTI), Hot Carrier Injection (HCI), and Electromigration (EM) have become more prevalent as electrical fields and current density continue to increase in scaled devices. In addition, the rapid introduction of process improvements, such as high-k/metal gate stacks, has led to new reliability issues including positive BTI (PBTI) in n-type transistors. Traditionally, designers deal with reliability problems by adding a conservative design guardband calculated by aging models based on the worst-case degradation scenario. However, there are a few issues associated with this method: 1. the power and performance overhead of guardbanding have started to increase in the newer technologies. 2. the aging models used by designers to are mostly based on the device probing data, which is not accurate to predict the circuit performance degradation. 3. the device probing has the drawbacks of expensive costs of probing equipment and limited timing resolution. In order to resolve these issues, one of the key aspects is to develop accurate and efficient means to measure the effects of different aging mechanisms on circuit parameters accurately. For this purpose, several unique on-chip circuit-based sensing systems have been proposed, which provide us with important advantages: namely, pico-second timing resolution for usage condition stress, micro-second measurement interruption to prevent unwanted recovery, and excellent immunity to voltage and temperature drifts. The proposed odometer designs utilize standard logic gates and a simple scan-based interface, making them suitable for integrating into an actual processor system. In this thesis, four dedicated on-chip circuit designs that we have implemented over two generation of process technology to characterize reliability issues on various types of circuits will be presented.fc.
机译:随着CMOS技术不断积极地扩展到其物理极限,集成电路的可靠性已成为越来越重要的设计考虑因素。随着电场和电流密度的不断提高,由诸如偏置温度不稳定性(BTI),热载流子注入(HCI)和电迁移(EM)之类的可靠性问题引起的参数漂移和电路故障变得越来越普遍。此外,诸如高k /金属栅叠层之类的工艺改进的迅速引入导致了新的可靠性问题,包括n型晶体管的正BTI(PBTI)。传统上,设计人员通过添加保守的设计保护带来处理可靠性问题,该保护带由基于最坏情况的退化情况的老化模型计算得出。但是,此方法存在一些问题:1.在新技术中,保护带的功能和性能开销已开始增加。 2.设计人员使用的老化模型主要基于器件探测数据,无法准确预测电路性能下降。 3.设备探测具有探测设备的昂贵成本和有限的定时分辨率的缺点。为了解决这些问题,关键方面之一是开发准确有效的手段,以准确地测量不同老化机制对电路参数的影响。为此,已经提出了几种独特的基于片上电路的传感系统,这些系统为我们提供了重要的优势:即使用条件应力的皮秒级定时分辨率,防止不必要恢复的微秒级测量中断以及出色的抗扰性电压和温度漂移。拟议的里程表设计利用标准逻辑门和基于扫描的简单接口,使其适合集成到实际处理器系统中。在本文中,将介绍我们已经在两代工艺技术上实施的四种专用片上电路设计,以表征各种类型电路的可靠性问题。

著录项

  • 作者

    Wang, Xiaofei.;

  • 作者单位

    University of Minnesota.;

  • 授予单位 University of Minnesota.;
  • 学科 Electrical engineering.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 149 p.
  • 总页数 149
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:53:45

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