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An efficient layout style for two-metal CMOS leaf cells and its automatic synthesis

机译:二金属CMOS叶单元的有效布局样式及其自动合成

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A layout style that enables either an automatic layout synthesizer or a layout designer to take full advantage of the second metal layer available from today's technology is proposed. The style not only facilitates power/ground diffusion overlapping but also simplifies the intracell routing problem by having power/ground in the middle and routing in the upper and the lower constraint-free regions. An automatic leaf cell layout synthesizer, called THEDA.P, that is based on the proposed style has been implement. Using the same transistor placement algorithm, THEDA.P outperforms a synthesizer based on T. Uehara and W.M. van Cleemput's (1981) approach by almost 20% in layout compactness across a wide range of small-scale integrated circuits. THEDA.P has been used to build a standard cell library that was previously handcrafted. Results from designing two modules show that THEDA.P's layout quality is very competitive.
机译:提出了一种布局样式,该样式可以使自动布局合成器或布局设计器充分利用当今技术中可用的第二金属层。该样式不仅有利于功率/接地扩散重叠,而且通过在中间具有功率/接地而在上部和下部无约束区域具有路由来简化小区内路由问题。已实现了一种基于拟议样式的自动叶单元布局合成器,称为THEDA.P。使用相同的晶体管放置算法,THEDA.P的性能优于基于T. Uehara和W.M.的合成器。 van Cleemput(1981)的方法在各种小型集成电路中的布局紧凑性几乎提高了20%。 THEDA.P已用于构建以前手工制作的标准细胞库。设计两个模块的结果表明,THEDA.P的版图质量极具竞争力。

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