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首页> 外文期刊>IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems >A new approach for modeling the MOSFET using a simple, continuous analytical expression for drain conductance which includes velocity-saturation in a fundamental way
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A new approach for modeling the MOSFET using a simple, continuous analytical expression for drain conductance which includes velocity-saturation in a fundamental way

机译:一种使用简单,连续的漏极电导分析表达式对MOSFET建模的新方法,其中包括基本的速度饱和

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摘要

A simple, analytical conduction model is presented which is continuous over both the linear and saturation regimes of device operation. It is based on an analysis of the drain conductance in which g/sub DS/ is modeled as a simple hyperbolic form from which drain characteristics are derived. The model is assessed by a chi-square curvefit analysis to show that it is extremely accurate for both long- and short-channel devices. The approach is supported by an analysis which includes the physics of velocity saturation at the fundamental level. Other short-channel effects associated with MOSFET operation may be developed with longitudinal mobility variation as the model foundation. The equation for the hyperbolic asymptotes will reduce to the traditional parabolic model of the MOSFET when classical assumptions are made for the saturation point. This feature of the model demonstrates the fundamental basis of the approach.
机译:提出了一个简单的分析传导模型,该模型在器件工作的线性和饱和状态下都是连续的。它基于对漏极电导率的分析,其中将g / sub DS /建模为简单的双曲线形式,从中得出漏极特性。通过卡方曲线拟合分析对模型进行评估,结果表明该模型对于长通道和短通道设备都非常准确。该方法得到分析的支持,该分析包括基本水平上的速度饱和物理学。以纵向迁移率变化为模型基础可以开发与MOSFET工作相关的其他短沟道效应。当对饱和点进行经典假设时,双曲渐近线的方程将简化为MOSFET的传统抛物线模型。该模型的这一特征证明了该方法的基本基础。

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