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首页> 外文期刊>IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems >A Novel Optimization Method for Parametric Yield: Uniform Design Mapping Distance Algorithm
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A Novel Optimization Method for Parametric Yield: Uniform Design Mapping Distance Algorithm

机译:参数产量的一种新的优化方法:均匀设计映射距离算法

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摘要

A novel algorithm UDMDA for parametric yield optimization of IC is proposed in this paper. The algorithm integrates uniform design (UD) and mapping distance. An effective yet simple measurement of uniformity of a set of points, namely k-nearest neighbor, is suggested in the UD. Compared with the available methods, the proposed algorithm does not need any calculation of gradient and assumption of initial point. Furthermore, this algorithm has a high convergence rate and is not sensitive to the size of circuit. Therefore, it can be utilized to optimize the nominal performance as well as improve parametric yield. The efficiency of this algorithm is illustrated with two circuit examples
机译:提出了一种用于IC参数良率优化的新算法UDDMA。该算法集成了统一设计(UD)和映射距离。在UD中建议了有效而简单的一组点(即k最近邻)的均匀性度量。与现有方法相比,该算法不需要计算梯度和初始点。此外,该算法具有较高的收敛速度,并且对电路的大小不敏感。因此,它可用于优化标称性能以及提高参数产量。通过两个电路示例说明了该算法的效率

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