机译:1.3-μm掩埋异质结构VCSELS与MOCVD生长的GaAs / Algaas变质DBRS
NTT Corp NTT Device Technol Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;
NTT Corp NTT Device Technol Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;
NTT Corp NTT Device Innovat Ctr 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;
NTT Corp NTT Device Technol Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;
distributed Bragg reflector lasers; surface emitting lasers; gallium arsenide; MOCVD; laser modes; III-V semiconductors; aluminium compounds; quantum well lasers; buried-heterostructure VCSEL; long-wavelength VCSEL; thermal resistance; single transverse mode; single-mode operation; metamorphic DBR; MOCVD; emission area; CW operation; temperature 17; 0 degC; size 15 mum; wavelength 1; 3 mum; GaAs-AlGaAs;
机译:选择性区域MOCVD的非吸收镜应变层InGaAs-GaAs-AlGaAs埋藏异质结构激光器
机译:在GaAs衬底上具有InGaAsP / InP-GaAs / AlAsDBR的1.55-μm埋藏异质结构VCSEL
机译:通过载流子寿命测量,在生长1.3μmInGaAsN-GaAsP-GaAs QW激光器的MOCVD中增加单分子复合
机译:1.3µm InGaAlAs / InP-AlGaAs / GaAs晶片融合VCSEL,调制速度高达10Gb / s,最高可达100°C
机译:MOCVD生长的GaAs / AlGaAs核壳纳米线的光致发光和共振拉曼光谱。
机译:在(100)和(311)B GaAs衬底上生长的GaAs / AlGaAs多量子阱的深层瞬态光谱
机译:分子束外延生长的亚毫安级阈值电流伪态InGaAs / AlGaAs埋藏异质结构量子阱激光器
机译:mOCVD生长的Gaas异质结太阳能电池中alGaas / Gaas界面的正电子湮没光谱