首页> 外文期刊>IEEE Transactions on Electron Devices >A two-dimensional analytical model of threshold voltages of short-channel MOSFETs with Gaussian-doped channels
【24h】

A two-dimensional analytical model of threshold voltages of short-channel MOSFETs with Gaussian-doped channels

机译:具有高斯掺杂沟道的短沟道MOSFET阈值电压的二维分析模型

获取原文
获取原文并翻译 | 示例

摘要

A two-dimensional analytical model for the threshold voltage of a short-channel MOSFET with a Gaussian-doped channel has been developed. The Gaussian profile has been simulated by a novel integrable function. This makes possible a purely analytical solution of the two-dimensional Poissons equation in the channel region of the MOSFET.
机译:建立了具有高斯掺杂沟道的短沟道MOSFET阈值电压的二维分析模型。高斯分布已通过一种新的可积函数进行了模拟。这使得在MOSFET的沟道区域中二维Poissons方程的纯解析解成为可能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号