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Investigation of the threshold voltage of MOSFETs with position- and potential-dependent interface trap distributions using a fixed-point iteration method

机译:使用定点迭代方法研究具有位置和电位相关的界面陷阱分布的MOSFET的阈值电压

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摘要

Simulation results are presented for a MOSFET with position- and energy- (potential-) dependent interface trap distributions that may be typical for devices subjected to interface-trap-producing processes such as hot-electron degradation. The interface-trap distribution is modeled as a Gaussian peak at a given position along the channel, and the energy dependence is derived from C-V measurements from an MOS capacitor exposed to ionizing radiation. A novel fixed-point technique is used to solve the two-dimensional boundary-value problem. The technique is shown to be globally convergent for arbitrary distributions of interface traps. A comparison of the convergence properties of the Newton and fixed-point methods is presented, and it is shown that for some important cases the Newton technique fails to converge while the fixed-point technique converges with a geometric convergence rate.
机译:给出了具有与位置和能量(势)有关的界面陷阱分布的MOSFET的仿真结果,这对于经历界面陷阱产生过程(例如热电子降解)的器件可能是典型的。界面陷阱分布被建模为沿着通道的给定位置处的高斯峰,并且能量相关性从暴露于电离辐射的MOS电容器的C-V测量得出。一种新颖的定点技术被用来解决二维边值问题。对于接口陷阱的任意分布,该技术显示为全局收敛的。比较了牛顿法和定点法的收敛性,发现在某些重要情况下,牛顿法不能收敛,而定点法以几何收敛速度收敛。

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