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The impact of interface and border traps on current-voltage, capacitance-voltage, and split-CV mobility measurements in InGaAs MOSFETs

机译:接口和边界陷阱对IngaAs MOSFET中电流电压,电容 - 电压和分裂 - CV移动性测量的影响

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摘要

In this article, we present coupled experimental/simulated results about the influence of interface and border traps on the electrical characteristics and split-CV mobility extraction in InGaAs MOSFETs. These results show that border traps limit the maximum drain current under on-state conditions, induce a hysteresis in the quasi-static transfer characteristics, as well as affect CV measurements, inducing an increase in the accumulation capacitance even at high frequencies where trap effects are commonly assumed to be negligible. Hysteresis in the transfer characteristics can be used as a sensitive monitor of border traps, as suggested by a sensitivity analysis where either the energetic or the spatial distribution of border traps are varied. Finally, we show that mobility extraction by means of the split-CV method is affected by appreciable errors related to the spurious contributions of interface and border traps to the total gate charge, ultimately resulting in significant channel mobility underestimation. In very narrow channel devices, channel electron spilling over the InP buffer layer can also contribute to mobility measurement inaccuracy.
机译:在本文中,我们提出了耦合的实验/模拟结果关于接口和边界陷阱对IngaAs MOSFET中的电气特性和分裂 - CV移动性提取的影响。这些结果表明,边界陷阱限制了在状态条件下的最大漏极电流,诱导了准静态传递特性的滞后,以及影响CV测量,即使在陷阱效果的高频下也会诱导累积电容的增加常见认为可以忽略不计。转移特性中的滞后可以用作边界陷阱的敏感监测器,如敏感性分析所提出的,其中横陷的狭阱的空间分布变化。最后,我们表明借助于分裂CV方法的移动性提取受与界面和边界陷阱对总栅极电荷的虚拟贡献相关的明显误差影响,最终导致显着的渠道流动性低估。在非常窄的沟道装置中,在INP缓冲层上溢出的通道电子也可以有助于移动性测量不准确性。

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