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Base transit time of shallow-base bipolar transistors considering velocity saturation at base-collector junction

机译:考虑基极-集电极结速度饱和的浅基极双极晶体管的基极渡越时间

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The authors studied the influence of the velocity saturation in the base-collector depletion layer and compared the injected electron concentration profile, collector current density, and base transit time with velocity saturation to those without. The collector current with velocity saturation is only a little smaller than the current without saturation, but the injection electron concentration profile changes substantially when comparing currents with and without velocity saturation. The base transit time is increased by velocity saturation, and the ratio of base transit time with velocity saturation to that without velocity saturation increases as the base width decreases. Thus, velocity saturation must be considered in order to evaluate the base transit time of shallow-base bipolar transistors. The dependence of the base transit time on the doping profile was also analyzed, revealing that the base transit time of a box doping profile is increased more than that of a Gaussian doping profile.
机译:作者研究了基极-集电极耗尽层中速度饱和的影响,并将注入的电子浓度分布,集电极电流密度和具有速度饱和的基极渡越时间与未注入时的电子饱和度曲线进行了比较。具有速度饱和的集电极电流仅比不具有饱和的电流小一点,但是当比较具有和不具有速度饱和的电流时,注入电子浓度分布会发生很大变化。基本穿越时间会因速度饱和而增加,并且随着基本宽度的减小,具有速度饱和的基础穿越时间与没有速度饱和的基础穿越时间之比会增加。因此,必须考虑速度饱和,以便评估浅基极双极晶体管的基极渡越时间。还分析了基本渡越时间对掺杂分布的依赖性,发现盒形掺杂分布的基础渡越时间比高斯掺杂分布的增加了更多。

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