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Analytical base transit time of integrated bipolar transistors in quasi-saturation and hard saturation

机译:准饱和和硬饱和状态下集成双极晶体管的基本分析渡越时间

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Based on the assumption of negligible recombination within the thin epitaxial collector layer of an integrated bipolar transistor switch in quasi-saturation, solutions to the collector minority carrier profile and transit time in the induced base are derived. In contrast to Dai and Yuan's analysis (l997), the present analysis takes both the drift and diffusion currents into account and is valid for all levels of injection. Dependence of transit time on characteristics of the epitaxial--substrate interface and recombination at the interface is studied for the transistor driven into hard saturation. At high effective surface recombination velocity, recombination at the interface cannot be neglected. The study shows that transit time increases more rapidly with collector current when the transistor operates in hard saturation and the interface is highly reflecting.
机译:基于在准饱和状态下集成双极晶体管开关的薄外延集电极层内重组可忽略不计的假设,得出了集电极少数载流子分布和感应基极中的渡越时间的解。与Dai和Yuan的分析(l997)相反,本分析同时考虑了漂移电流和扩散电流,并且对于所有水平的注入都是有效的。对于被驱动到硬饱和的晶体管,研究了渡越时间对外延-衬底界面特性和界面复合的依赖性。在有效的表面复合速度高的情况下,不能忽略界面处的复合。研究表明,当晶体管工作在硬饱和状态且界面高度反射时,传输时间随集电极电流的增加而更快。

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