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Monte Carlo analysis of nonequilibrium electron transport in InAlGaAs/InGaAs HBT's

机译:InAlGaAs / InGaAs HBT中非平衡电子传输的蒙特卡洛分析

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A Monte Carlo analysis of nonequilibrium electron transport in InAlGaAs/InGaAs HBTs is discussed. The discussion focuses on hot electron transport in a heavily doped p-type base from the viewpoint of high-speed transistor performance. Simulation shows that a hybrid base structure which incorporates an abrupt emitter/base junction and a graded base layer has a shorter base transit time than conventional uniform base structures with an abrupt emitter or fully graded base structures. The short base transit time is due to the high initial electron velocity provided by the abrupt emitter/base junction and the acceleration of energy-relaxed electrons (which cause a lowering of average electron velocity in the base region) by a built-in electric field in the graded base layer. The influence of hot electron injection into the collector is also considered.
机译:讨论了在InAlGaAs / InGaAs HBT中非平衡电子传输的蒙特卡洛分析。从高速晶体管性能的角度,讨论集中在重掺杂p型基极中的热电子传输上。仿真表明,与具有突然发射极或完全渐变的基础结构的常规均匀基础结构相比,结合了陡峭的发射极/基极结和渐变的基础层的混合基础结构具有更短的基板传输时间。短的基极渡越时间是由于突然的发射极/基极结提供了很高的初始电子速度,并且由于内置电场加速了能量弛豫电子的加速(这导致基极区域中平均电子速度降低)在分级基础层中。还考虑了热电子注入到收集器中的影响。

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