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首页> 外文期刊>IEEE Transactions on Electron Devices >Current-drive enhancement limited by carrier velocity saturation in deep-submicrometer fully depleted SOI MOSFETs
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Current-drive enhancement limited by carrier velocity saturation in deep-submicrometer fully depleted SOI MOSFETs

机译:深亚微米全耗尽SOI MOSFET中的载流子速度饱和限制了电流驱动的增强

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摘要

Simulations and measurements of SOI MOSFETs are presented with analytical insight to reveal the severe limitation of current-drive enhancement caused by carrier velocity saturation in the deep-submicrometer fully depleted device. For L=0.1 mu m, the enhancement, which tends to result from the suppressed body charge and electric field in the thin-film device, is virtually negated by the velocity saturation driven by the high longitudinal electric field.
机译:SOI MOSFET的仿真和测量具有分析洞察力,可揭示深亚微米完全耗尽型器件中载流子速度饱和引起的电流驱动增强的严重局限性。在L =0.1μm的情况下,由高纵向电场驱动的速度饱和实际上抵消了由于薄膜器件中的体电荷和电场的抑制而引起的增强。

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