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Design of single-gate n-channel and p-channel MOSFETs with enhanced current-drive due to simultaneous switching of front and back channels in SOI CMOS technology

机译:通过同时切换SOI CMOS技术中的前,后通道,增强电流驱动的单栅极n沟道和p沟道MOSFET的设计

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摘要

In this paper, we show that when single gate SOI MOSFETs are biased at a particular ideal back gate voltage, the front and back channels can be turned ON and OFF simultaneously using the front gate voltage, thereby enhancing the current drive of the device. It is shown by analytical models as well as 2-D numerical simulation that both maximum transconductance and minimum subthreshold slope are obtained for this ideal back gate bias. Subsequently, n-channel and p-channel MOSFETs are designed for a conventional SOI CMOS process, where both the front and back channels of these devices turn ON and OFF simultaneously resulting in enhanced current drive and superior performance. The design has been carried out with the help of analytical formulation and verified using the 2-D Device Simulator MEDICI.
机译:在本文中,我们表明,当单栅极SOI MOSFET以特定的理想背栅极电压偏置时,可以使用前栅极电压同时打开和关闭前沟道和后沟道,从而增强了器件的电流驱动能力。分析模型和二维数值模拟表明,对于该理想的背栅偏置,可以获得最大跨导和最小亚阈值斜率。随后,为传统的SOI CMOS工艺设计了n沟道和p沟道MOSFET,其中这些器件的前沟道和后沟道同时导通和截止,从而增强了电流驱动能力并提高了性能。设计是借助分析配方进行的,并使用2-D Device Simulator MEDICI进行了验证。

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