首页> 外文期刊>IEEE Transactions on Electron Devices >A new linear sweep technique to measure generation lifetimes in thin-film SOI MOSFET's
【24h】

A new linear sweep technique to measure generation lifetimes in thin-film SOI MOSFET's

机译:一种新的线性扫描技术,可测量薄膜SOI MOSFET的产生寿命

获取原文
获取原文并翻译 | 示例

摘要

A new linear sweep technique to measure generation lifetimes (/spl tau//sub g/) in silicon-on-insulator (SOI) material is presented. A detailed analytic formulation is applied to fully-depleted and partially-depleted SOI films and used to simulate the behavior of the SOI devices under linear sweep conditions. A novel algorithm accurately determines the effective generation width in fully depleted SOI films. The measurement technique is experimentally verified by applying the algorithm to fully depleted SIMOX P-channel MOSFET's where observed lifetimes ranged from 0.3 /spl mu/s to 2.4 /spl mu/s.
机译:提出了一种新的线性扫描技术,用于测量绝缘体上硅(SOI)材料的产生寿命(/ spl tau // sub g /)。详细的分析公式适用于完全耗尽和部分耗尽的SOI膜,并用于模拟线性扫描条件下SOI器件的行为。一种新颖的算法可精确确定完全耗尽的SOI膜中的有效生成宽度。通过将该算法应用到完全耗尽的SIMOX P沟道MOSFET进行了实验验证,测量的寿命范围为0.3 / spl mu / s至2.4 / spl mu / s。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号