We present a new two-step white-light spectral interferometric technique to measure a nonlinear phase function of a thin-film structure. The technique is based on recording of channeled spectra at the output of a Michelson interferometer and their processing by using a windowed Fourier transform to retrieve the phase functions. First, the phase function including the effect of a thin-film structure is retrieved. Second, the structure is replaced by a reference sample of known phase change on reflection and the corresponding phase function is retrieved. From the two functions, the nonlinear phase function of the thin-film structure is obtained. The feasibility of this simple method is confirmed in processing the experimental data for a SiO2 thin film on a Si wafer of known optical constants. Four samples of the thin film are used and their thicknesses are determined. The thicknesses obtained are compared with those resulting from reflectometric measurements, and a good agreement is confirmed.
展开▼
