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High performance symmetric double /spl delta/-doped GaAs/InGaAs/GaAs pseudomorphic HFETs grown by MOCVD

机译:通过MOCVD生长的高性能对称双/ spl delta /掺杂GaAs / InGaAs / GaAs伪非晶HFET

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摘要

High performance double /spl delta/-doped GaAs/In/sub 0.25/Ga/sub 0.75/ As/GaAs pseudomorphic HFETs grown by low pressure MOCVD are reported. An extrinsic transconductance as high as 390 mS/mm, and a saturation current density as high as 980 mA/mm along with broad transconductance plateau at 300 K with a 1.5 /spl mu/m gate length, are achieved.
机译:报道了通过低压MOCVD生长的高性能双/ splδ/掺杂的GaAs / In / sub / 0.25 / Ga / sub 0.75 / As / GaAs伪晶HFET。实现了高达390 mS / mm的非本征跨导,以及高达300 mA且栅极长度为1.5 / spl mu / m的宽跨导平台,以及高达980 mA / mm的饱和电流密度。

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