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Temperature dependent study of the microwave performance of 0.25-/spl mu/m gate GaAs MESFETs and GaAs pseudomorphic HEMTs

机译:0.25- / spl mu / m栅GaAs MESFET和GaAs伪晶HEMT的微波性能的温度依赖性研究

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摘要

We report on the noise figure, associated gain, and the current gain cutoff frequency for comparable 0.25-/spl mu/m gate GaAs MESFETs and GaAs pseudomorphic HEMTs (p-HEMTs) as a function of cryogenic temperature. Contrary to previously published results which suggest that p-HEMTs should have a higher electron velocity and a lower noise figure than MESFETs due to the effects of the two-dimension electron gas (2-DEG), we have experimentally verified that this is not the case. We show clear evidence that the transport properties of the 2-DEG in p-HEMTs do not make a significant contribution to the speed enhancement and noise reduction during high-frequency operation of these devices. It is the fundamental InGaAs material properties, specifically the /spl Gamma/-L valley separation in the conduction band and associated effective mass of the electron in either GaAs or InGaAs channel, which limits the high-field electron velocity and thus the speed and noise performance of the devices.
机译:我们报告了可比的0.25- / spl mu / m栅极GaAs MESFET和GaAs伪形HEMT(p-HEMT)的噪声系数,相关增益和电流增益截止频率与低温的关系。与先前发表的结果相反,由于二维电子气(2-DEG)的影响,p-HEMTs应该比MESFET具有更高的电子速度和更低的噪声系数,我们已经通过实验证明这不是案件。我们显示出明确的证据,表明在p-HEMT中2-DEG的传输特性对这些设备的高频操作过程中的速度提高和降噪没有显着贡献。 InGaAs的基本材料特性,特别是导带中的/ spl Gamma / -L谷间隔和GaAs或InGaAs通道中电子的相关有效质量,限制了高场电子速度,从而限制了速度和噪声设备的性能。

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