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Studies of high DC current induced degradation in III-V nitride based heterojunctions

机译:III-V氮化物基异质结中高直流电流引起的退化的研究

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We report experiments on high dc current stressing in commercial III-V nitride based heterojunction light-emitting diodes. Stressing currents ranging from 100 mA to 200 mA were used. Degradations in the device properties were investigated through detailed studies of the current-voltage (I-V) characteristics, electroluminescence, deep-level transient Fourier spectroscopy and flicker noise. Our experimental data demonstrated significant distortions in the I-V characteristics subsequent to electrical stressing. The room temperature electroluminescence of the devices exhibited a 25% decrement in the peak emission intensity. Concentration of the deep-levels was examined by deep-level transient Fourier spectroscopy, which indicated an increase in the density of deep-traps from 2.7/spl times/10/sup 13/ cm/sup -3/ to 4.2/spl times/10/sup 13/ cm/sup -3/ at E/sub 1/=E/sub C/-1.1 eV. The result is consistent with our study of 1/f noise, which exhibited up to three orders of magnitude increase in the voltage noise power spectra. These traps are typically located at energy levels beyond the range that can be characterized by conventional techniques including DLTS. The two experiments, therefore, provide a more complete picture of trap generation due to high dc current stressing.
机译:我们报告了基于商用III-V氮化物的异质结发光二极管中高直流电流应力的实验。使用的应力电流范围为100 mA至200 mA。通过详细研究电流-电压(I-V)特性,电致发光,深层瞬态傅里叶光谱和闪烁噪声,研究了器件性能的下降。我们的实验数据表明,在电应力作用下,IV特性会发生明显的失真。器件的室温电致发光在峰值发射强度上降低了25%。通过深层瞬态傅里叶光谱法检查了深层的浓度,这表明深层捕集阱的密度从2.7 / spl次/ 10 / sup 13 / cm / sup -3 /增至4.2 / spl次/ E / sub 1 / = E / sub C / -1.1 eV时10 / sup 13 / cm / sup -3 /该结果与我们对1 / f噪声的研究一致,后者在电压噪声功率谱中显示出最多增加了三个数量级。这些陷阱的能量水平通常超出包括DLTS在内的常规技术可以表征的范围。因此,由于高直流电流应力,这两个实验提供了更完整的陷阱产生图。

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