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Stable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices

机译:基于氮化铝的ReRAM器件中观察到的稳定的双极电阻切换特性和电阻切换机制

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The authors report upon the ultrafast bipolar switching characteristics observed in aluminum nitride (AlN)-based resistive random access memory devices ReRAMs. The set and reset states were measured to be as low as 2 $muhbox{A}$ and 5 nA, respectively, at $V_{rm read} = hbox{0.1} hbox{V}$. Regarding pulse operations, very fast switching characteristics were achieved at 3 V/10 ns for the set operation and $-$3 V/10 ns for the reset operation. In addition, the AlN-based ReRAMs showed an endurance value of over $sim!hbox{10}^{8} hbox{cycles}$ and a retention time of over ten years at 85 $^{circ}hbox{C}$ . These results show that this AlN-based ReRAM can be used as a promising high-speed nonvolatile memory device.
机译:作者报告了在基于氮化铝(AlN)的电阻型随机存取存储设备ReRAM中观察到的超快速双极开关特性。在$ V_ {rm read} = hbox {0.1} hbox {V} $时,置位和复位状态的测量值分别低至2 $ muhbox {A} $和5 nA。关于脉冲操作,在设置操作下为3 V / 10 ns,在复位操作下为$-$ 3 V / 10 ns,获得了非常快的开关特性。此外,基于AlN的ReRAM的耐久值超过$ sim!hbox {10} ^ {8} hbox {cycle} $,保留时间超过十年,为85 $ ^ {circ} hbox {C} $ 。这些结果表明,这种基于AlN的ReRAM可用作有前途的高速非易失性存储设备。

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