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首页> 外文期刊>Electron Devices, IEEE Transactions on >Surface-Potential-Based Compact Modeling of Gate Current in AlGaN/GaN HEMTs
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Surface-Potential-Based Compact Modeling of Gate Current in AlGaN/GaN HEMTs

机译:基于表面电势的AlGaN / GaN HEMT中栅极电流的紧凑建模

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摘要

In this paper, the gate current in AlGaN/GaN high-electron mobility transistors is modeled analytically in a surface potential-based compact model. Thermionic emission and Poole–Frenkel emission are two dominant mechanisms for the gate current in the forward and reverse-bias regions, respectively. In addition, a trap-assisted tunneling component, which is important at low reverse bias, is also added. The developed gate current model, implemented in Verilog-A is in excellent agreement with experimental data and passes the important Gummel symmetry test.
机译:在本文中,在基于表面电势的紧凑模型中对AlGaN / GaN高电子迁移率晶体管中的栅极电流进行了分析建模。热电子发射和Poole-Frenkel发射分别是正向和反向偏置区域中栅极电流的两个主要机制。此外,还添加了陷阱辅助隧穿组件,该组件在低反向偏置时很重要。在Verilog-A中实现的开发的栅极电流模型与实验数据非常吻合,并通过了重要的Gummel对称性测试。

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