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ON-State Degradation in AlGaN/GaN-on-Silicon Schottky Barrier Diodes: Investigation of the Geometry Dependence

机译:AlGaN /硅上的GaN肖特基势垒二极管的导通态降解:几何相关性的研究

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摘要

In this paper, we present the results of a combined measurement/simulation analysis of the degradation induced by on-state stress in Au-free AlGaN/gallium-nitride-on-Si Schottky barrier diodes (SBDs). Turn-on voltage (VTON) and on-resistance (RON) are affected by charge carrier trapping/detrapping, occurring in different regions and caused by different mechanisms, when a high stress current is applied to the device. In particular, we have investigated the degradation of SBDs adopting different stress conditions and analyzing the influence of the diode geometry; consequently, we were able to identify the physical mechanisms responsible for long-term degradation of VTON and RON. In addition, thanks to this approach, a critical electric field for the RON degradation has been determined.
机译:在本文中,我们介绍了无金AlGaN / Si上肖特基势垒二极管(SBDs)中由导通应力引起的退化的组合测量/模拟分析结果。当向器件施加高应力电流时,导通电压(VTON)和导通电阻(RON)受电荷载流子俘获/释放的影响,电荷载流子俘获/释放发生在不同区域且由不同机制引起。特别是,我们研究了在不同应力条件下SBD的退化,并分析了二极管几何形状的影响。因此,我们能够确定导致VTON和RON长期降解的物理机制。另外,由于这种方法,已经确定了RON降解的临界电场。

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