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Influence of buffer layer thickness on DC performance of GaAs/AlGaAs heterojunction bipolar transistors grown on silicon substrates

机译:缓冲层厚度对生长在硅衬底上的GaAs / AlGaAs异质结双极晶体管的直流性能的影响

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The DC performance of GaAs/AlAs heterojunction bipolar transistors (HBTs) grown on silicon substrates with buffer layers ranging from 0 to 5 mu m was investigated. Current gain, collector-emitter breakdown voltage, emitter-base and collector-base diode ideality factors, and breakdown voltages were measured as the buffer layer thickness was varied between 0 and 5 mu m. The current gain steadily increases with increasing buffer layer thickness until the layer reaches 3 mu m. However, the other DC parameters are relatively insensitive to the buffer layer thickness. A small-signal current gain of 60 is typically achieved for devices with 6*6- mu m/sup 2/ emitters at a density of 6*10/sup 4/ A/cm/sup 2/ when the buffer layer is
机译:研究了GaAs / AlAs异质结双极晶体管(HBT)在缓冲层范围为0至5μm的硅基板上生长的直流性能。当缓冲层厚度在0至5μm之间变化时,测量电流增益,集电极-发射极击穿电压,发射极-基极和集电极-基极二极管的理想因子以及击穿电压。电流增益随着缓冲层厚度的增加而稳定增加,直到该层达到3μm。但是,其他DC参数对缓冲层的厚度相对不敏感。当缓冲层小于或等于6 * 10μm/ sup 2 /发射器且密度为6 * 10 / sup 4 / A / cm / sup 2 /时,通常会获得60的小信号电流增益。 = 3微米

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