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首页> 外文期刊>IEEE Electron Device Letters >Analytic description of short-channel effects in fully-depleted double-gate and cylindrical, surrounding-gate MOSFETs
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Analytic description of short-channel effects in fully-depleted double-gate and cylindrical, surrounding-gate MOSFETs

机译:完全耗尽的双栅极和圆柱形环绕栅极MOSFET中的短沟道效应的解析描述

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摘要

Short-channel effects in fully-depleted double-gate (DG) and cylindrical, surrounding-gate (Cyl) MOSFETs are governed by the electrostatic potential as confined by the gates, and thus by the device dimensions. The simple but powerful evanescent-mode analysis shows that the length /spl lambda/, over which the source and drain perturb the channel potential, is 1//spl pi/ of the effective device thickness in the double-gate case, and 1/4.810 of the effective diameter in the cylindrical case, in excellent agreement with PADRE device simulations. Thus for equivalent silicon and gate oxide thicknesses, evanescent-mode analysis indicates that Cyl-MOSFETs can be scaled to 35% shorter channel lengths than DG-MOSFETs.
机译:在完全耗尽的双栅极(DG)和圆柱形,环绕栅极(Cyl)MOSFET中,短沟道效应受栅极限制的静电势控制,因此受器件尺寸限制。简单但有效的渐逝模式分析表明,在双栅极情况下,源极和漏极干扰沟道电势的长度/ spl lambda /是有效器件厚度的1 // spl pi /。圆柱形外壳的有效直径为4.810,与PADRE器件仿真非常吻合。因此,对于等效的硅和栅氧化层厚度,e逝模式分析表明,Cyl-MOSFET的沟道长度可比DG-MOSFET缩短35%。

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