首页> 外文期刊>Electron Device Letters, IEEE >Analytical Models for Drain Current and Gate Capacitance in Amorphous InGaZnO Thin-Film Transistors With Effective Carrier Density
【24h】

Analytical Models for Drain Current and Gate Capacitance in Amorphous InGaZnO Thin-Film Transistors With Effective Carrier Density

机译:具有有效载流子密度的非晶InGaZnO薄膜晶体管的漏极电流和栅极电容的解析模型

获取原文
获取原文并翻译 | 示例

摘要

Analytical drain current and gate capacitance models for amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) over sub- and above-threshold regions are proposed by adopting an effective carrier density for the dominant carrier density. The effective carrier density fully considers the free carriers in the conduction band, the localized subgap deep states, and tail states over the bandgap for analytical $I$ –$V$ and $C$–$V$ characteristics. The proposed analytical models are verified by comparing the measured $I$ –$V$ and $C$ –$V$ characteristics. The proposed models make a time-efficient simulation of a-IGZO TFT-based circuits possible due to their analytical form.
机译:通过采用有效载流子密度作为主要载流子密度,提出了低于阈值和高于阈值区域的非晶InGaZnO(a-IGZO)薄膜晶体管(TFT)的分析漏电流和栅极电容模型。有效载流子密度充分考虑了导带中的自由载流子,局部带隙深状态和带隙上的尾态,以分析$ I $ – $ V $和$ C $ – $ V $特性。通过比较测得的$ I $ – $ V $和$ C $ – $ V $特性来验证所提出的分析模型。所提出的模型由于其分析形式而使基于a-IGZO TFT的电路的高效仿真成为可能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号