首页> 外文期刊>Electron Device Letters, IEEE >Occurrence of Resistive Switching and Threshold Switching in Atomic Layer Deposited Ultrathin (2 nm) Aluminium Oxide Crossbar Resistive Random Access Memory
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Occurrence of Resistive Switching and Threshold Switching in Atomic Layer Deposited Ultrathin (2 nm) Aluminium Oxide Crossbar Resistive Random Access Memory

机译:原子层沉积的超薄(2 nm)氧化铝交叉开关电阻式随机存取存储器中的电阻开关和阈值开关的发生

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Resistive random access memory (RRAM) is a promising emerging nonvolatile memory which offer high density integration in the form of cross-bar array design. Selector devices are a vital requirement to suppress the cross-talk issue. In this letter, we are going to demonstrate the coexistence of resistive switching (RS) and threshold switching (TS) in an ultrathin 2-nm Aluminium oxide (AlO)-based crossbar RRAM devices. Depending on current level the device itself can switch from TS to RS mode with a nonlinearity of . Stable TS of cycles has been achieved at 10 nA. Achievements of this letter offers the usability of 2-nm AlO RRAM devices as a selector and as a memory device for high density crossbar array integration.
机译:电阻式随机存取存储器(RRAM)是一种很有前途的新兴非易失性存储器,以交叉开关阵列设计的形式提供高密度集成。选择器设备是抑制串扰问题的重要要求。在这封信中,我们将演示基于超薄2纳米氧化铝(AlO)的纵横制RRAM器件中电阻开关(RS)和阈值开关(TS)的共存。根据电流水平,设备本身可以从TS模式切换到RS模式,非线性为。稳定的TS周期已达到10 nA。这封信的成就提供了2纳米AlO RRAM器件作为选择器和存储器件的可用性,可用于高密度交叉开关阵列集成。

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