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Effect of Weak Magnetic Field Treatment on Optical Properties ofEpitaxial GaN Films

机译:弱磁场处理对外延GaN薄膜光学性能的影响

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The results of optical studies of the effect of pulsed magnetic field (B = 60 mT, τ = 1.2 ms, t = 5 min) on thestructural perfection and recombination properties of epitaxial GaN films grown on sapphire are presented. Nonmonotonicchanges in the spectral dependence of transmittance and photoluminescence were detected for GaN films after exposure tomagnetic field. They occurred during several days, with a maximum deviation from the initial values on the 12th day. Theobserved effect is presumably related to the magnetic field-induced changes in parameters of the surfaces and interfaces ofepitaxial films.
机译:给出了对脉冲磁场(B = 60 mT,τ= 1.2 ms,t = 5 min)对蓝宝石上生长的外延GaN膜的结构完善和复合性能的影响的光学研究结果。在暴露于磁场之后,对GaN薄膜检测到透射率和光致发光的光谱依赖性的非单调变化。它们发生在几天内,最大偏离第12天的初始值。观察到的效果可能与外延膜的表面和界面参数的磁场诱导变化有关。

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